Anomalous electron transport in high power impulse magnetron sputtering
نویسندگان
چکیده
منابع مشابه
Cross-field ion transport during high power impulse magnetron sputtering
In this study, the effect on thin film growth due to an anomalous electron transport, found in high power impulse magnetron sputtering (HiPIMS) has been investigated for the case of a planar circular magnetron. An important consequence of this type of transport is that it affects the way ions are being transported in the plasma. It was found that a significant fraction of ions are transported r...
متن کاملHigh power impulse magnetron sputtering discharge
J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson, High power impulse magnetron sputtering discharge, 2012, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, (30), 030801. http://dx.doi.org/10.1116/1.3691832 Copyright: American Vacuum Society, This article may be downloaded for personal use only. Any other use requires prior permission of the author and the ...
متن کاملUnderstanding deposition rate loss in high power impulse magnetron sputtering
The lower deposition rate for high power impulse magnetron sputtering (HiPIMS) compared to direct current magnetron sputtering for the same average power is often reported as a drawback. The often invoked reason is back-attraction of ionized sputtered material to the target, due to a substantial negative potential profile from the location of ionization towards the cathode. Emitting and swept L...
متن کاملPlasma properties in high power impulse magnetron sputtering
.....................................................................................................I PREFACE.......................................................................................................III PAPERS INCLUDED IN THE THESIS ........................................................... V RELATED PUBLICATIONS NOT INCLUDED IN THE THESIS.................... VI ACKNOWLEDGEMENTS ...
متن کاملEnergy flux measurements in high power impulse magnetron sputtering
The total energy flux in a high power impulse magnetron sputtering (HiPIMS) plasma has been measured using thermal probes. Radial flux (parallel to the magnetron surface) as well as axial flux (perpendicular to the magnetron surface) were measured at different positions, and resulting energy flux profiles for the region between the magnetron and the substrate are presented. It was found that th...
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ژورنال
عنوان ژورنال: Plasma Sources Science and Technology
سال: 2008
ISSN: 0963-0252,1361-6595
DOI: 10.1088/0963-0252/17/2/025007